カテゴリー
Temperature programmed desorption 昇温脱離

Short Lecture 11: Mari Maeda (Tokyo University of Science)”Evaluation of her Cs-Sb compound photocathode deposited on a GaAs substrate using temperature programmed desorption method”

カテゴリー
Temperature programmed desorption 昇温脱離

Clearrise official channel

https://www.youtube.com/channel/UCsdnvndwKH1uhMozmkxZ84Q

カテゴリー
Hydrogen embrittlement 水素脆化 Semiconductor inspection 半導体検査 Temperature programmed desorption 昇温脱離

Denshi Kagaku Co., Ltd. was started in July 1978 as a small mass spectrometry manufacturer.

Since our founding, we have developed and provided products that can be applied to various fields such as technological innovation in cutting-edge technology analysis, aggregation of knowledge, pursuit of high added value, and conservation of global resources and the environment. Based on the wafer generated gas analyzer, which was originally intended for semiconductors, this TDS has been used in various industries such as semiconductors, liquid crystals, organic EL, electricity, steel, automobiles, and ceramics in Japan and overseas. We have provided this to the field.

https://www.escoltd.co.jp/

高周波加熱TDS
Loadlock
赤外線加熱方式
QMSイオン化室の配置
カテゴリー
Hydrogen embrittlement 水素脆化 Semiconductor inspection 半導体検査 Temperature programmed desorption 昇温脱離

Argon standard sample measurement

カテゴリー
Hydrogen embrittlement 水素脆化 Semiconductor inspection 半導体検査 Temperature programmed desorption 昇温脱離

Hydrogen standard sample measurement

カテゴリー
Temperature programmed desorption 昇温脱離

[TDS] Temperature programmed desorption gas analysis methodTDS:Thermal Desorption Spectrometry

https://www.mst.or.jp/method/tabid/136/Default.aspx

Features

TDS is a mass spectrometry method that can monitor gases generated by vacuum heating/temperature elevation at different temperatures.
In a TDS spectrum, the horizontal axis represents temperature and the vertical axis represents ion intensity. This makes it possible to compare the amount of desorbed gas released and the desorption temperature. Furthermore, since it is under a vacuum atmosphere, hydrogen and water can also be analyzed with high sensitivity.

 It is possible to know the relationship between the gas and pressure desorbed from the sample and the temperature at which it occurs.
 Because only the sample can be heated, the background is low and high-sensitivity analysis of low-mass molecules such as hydrogen, water, oxygen, and nitrogen is possible.
 Estimation of components of gas generated from samples and quantitative analysis (number of molecules) possible

Application example

 Evaluation of organic and inorganic contamination on wafer surfaces (Si substrates, glass substrates, SiC substrates, etc.)
 Moisture evaluation in thin films (oxide film, nitride film, metal film, resist film, etc.)
 Investigation of residual film-forming gas (due to film-forming materials, film-forming environment, etc.)
 Investigation of residues from cleaning, etching, etc.
 Investigating the cause of abnormalities such as membrane peeling and blistering
 Annealing temperature evaluation of organic film
 Investigation of degassing from various materials such as packages and adhesives
 H2 desorption etc.